The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 12, 2021
Filed:
Oct. 13, 2017
Applicant:
Toyo Gosei Co., Ltd., Chiba, JP;
Inventors:
Yusuke Suga, Chiba, JP;
Satoshi Enomoto, Chiba, JP;
Assignee:
TOYO GOSEI CO., LTD., Chiba, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07C 381/12 (2006.01); C07C 43/315 (2006.01); G03F 7/004 (2006.01); G03F 7/039 (2006.01); G03F 7/38 (2006.01);
U.S. Cl.
CPC ...
C07C 381/12 (2013.01); C07C 43/315 (2013.01); G03F 7/0045 (2013.01); G03F 7/039 (2013.01); G03F 7/38 (2013.01);
Abstract
An onium salt and a composition having high sensitivity and excellent pattern characteristics such as LWR, which is preferably used for a resist composition for a lithography process using two active energy rays of a first active energy ray such as an electron beam or an extreme ultraviolet and a second active energy ray such as UV.