The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 12, 2021
Filed:
Feb. 25, 2020
Seiko Epson Corporation, Tokyo, JP;
So Yokota, Okaya, JP;
Seiko Epson Corporation, Tokyo, JP;
Abstract
While moving an ejecting unit, first patterns and second patterns are formed in a first direction on a medium. Third patterns corresponding to the first patterns are formed while changing a shifted amount by which the third patterns is shifted from the first patterns by a first shift amount in the second direction. Fourth patterns corresponding to the second patterns are formed while changing a shifted amount by which the fourth patterns is shifted from the second patterns by a first shift amount in the second direction. In a rough adjustment pattern, image density of a pair of patterns, which are formed of the first pattern and the corresponding third pattern, changes in the first direction in a first cycle. In a fine adjustment pattern, image density of a pair of patterns, which are formed of the second pattern and the corresponding fourth pattern, changes in a second cycle.