The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 12, 2021

Filed:

Mar. 27, 2019
Applicant:

Spiration, Inc., Redmond, WA (US);

Inventors:

Adam Lee Smith, Palm Desert, CA (US);

Clifton A. Alferness, Olalla, WA (US);

Gina M. Muia-Longman, Seattle, WA (US);

Clinton L. Finger, Bellevue, WA (US);

Assignee:

Gyrus ACMI, Inc., Westborough, MA (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
A61B 17/115 (2006.01); A61B 90/00 (2016.01); A61B 17/04 (2006.01); A61B 17/11 (2006.01); A61B 17/00 (2006.01);
U.S. Cl.
CPC ...
A61B 17/1152 (2013.01); A61B 17/0469 (2013.01); A61B 17/11 (2013.01); A61B 90/361 (2016.02); A61B 90/37 (2016.02); A61B 2017/00566 (2013.01); A61B 2017/1107 (2013.01); A61B 2017/1121 (2013.01); A61B 2017/1125 (2013.01); A61B 2017/1132 (2013.01);
Abstract

Disclosed embodiments include apparatuses, systems, and methods for facilitating anastomosis between bodily passages. In an illustrative embodiment, an eversion mechanism is configured to engage a first external surface of a receiving passage adjacent a first opening in the receiving passage in order to create a receiving flange presenting a first interior face. A donor support mechanism is configured to support a donor passage with an opening in an end in an everted position that forms a donor flange presenting a second interior face. The donor support mechanism is further configured to present the second interior face of the donor flange against the first interior face of the receiving flange to present a passage juncture. A suturing mechanism is configured to motivate a filament through a helical path around the passage juncture to suture the second interior face of the donor passage to the first interior face of the receiving passage.


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