The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 12, 2021
Filed:
May. 24, 2017
Hitachi, Ltd., Tokyo, JP;
Ryota Satoh, Tokyo, JP;
Toru Shirai, Tokyo, JP;
Yo Taniguchi, Tokyo, JP;
Yoshitaka Bito, Tokyo, JP;
Hisaaki Ochi, Tokyo, JP;
Yoshihisa Sotome, Tokyo, JP;
HITACHI, LTD., Tokyo, JP;
Abstract
Accuracy degradation due to a signal loss is reduced, and susceptibility is calculated with high accuracy where, by using an MRI, at least one echo is acquired where spatial magnetic field inhomogeneity is reflected, and a complex image is calculated from the acquired echo. Three masks are calculated from the calculated complex image; a low-signal region mask representing a low signal region, a first high-signal region mask representing a high signal and high fat content region, and a second high-signal region mask representing a high signal and low fat content region. In calculating a susceptibility image from a frequency image or a magnetic field image generated from the complex image, the susceptibility image is obtained under the constraint that a region defined by the low-signal region is set as a background and the susceptibility of the region defined by the second high-signal region mask is set to a specific value.