The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 05, 2021
Filed:
Jul. 17, 2019
Applicant:
Semes Co., Ltd., Chungcheongnam-do, KR;
Inventor:
Youngje Um, Busan, KR;
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/263 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
H01L 21/263 (2013.01); H01L 21/67017 (2013.01); H01L 21/67028 (2013.01); H01L 21/67173 (2013.01); H01L 21/67178 (2013.01); H01L 21/67207 (2013.01);
Abstract
Disclosed are a substrate treating apparatus and a substrate treating method. The substrate treating apparatus includes a chamber providing an interior space for treating a substrate, a support unit provided in the chamber and configured to support the substrate, a first ejection unit having a first nozzle configured to supply a first cleaning medium in an aerosol state to the substrate supported by the support unit, and a second ejection unit having a second nozzle configured to supply a second cleaning medium to the substrate supported by the support unit.