The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 05, 2021
Filed:
Jun. 05, 2019
Hamilton Sundstrand Corporation, Charlotte, NC (US);
Yanzhi Chen, Shanghai, CN;
Qingqing Zhang, Shanghai, CN;
Tahany Ibrahim El-Wardany, Vernon, CT (US);
Ranadip Acharya, Rocky Hill, CT (US);
Colette Opsahl Fennessy, West Hartford, CT (US);
William K. Tredway, Manchester, CT (US);
HAMILTON SUNDSTRAND CORPORATION, Charlotte, NC (US);
Abstract
An additive manufacturing (AM) system includes a process distortion compensation computing system and an AM peripheral device. The process distortion compensation computing system determines a digital nominal model that represents a physical target object excluding a distortion, and a digital distortion model that represents the physical target object including at least one distortion. The AM peripheral device forms a three-dimensional (3D) physical object based on a digital compensation model. The process distortion compensation computing system also determines a digital skeletal model indicating a predicted change in at least one of the shape and volume of the nominal model, and generates the digital compensation model based on the skeletal model that compensates for the at least one distortion.