The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 05, 2021
Filed:
Nov. 19, 2014
California Institute of Technology, Pasadena, CA (US);
Lihong V. Wang, Creve Coeur, MO (US);
Lidai Wang, St. Louis, MO (US);
Chi Zhang, St. Louis, MO (US);
Puxiang Lai, St. Louis, MO (US);
Jian Wei Tay, St. Louis, MO (US);
California Institute of Technology, Pasadena, CA (US);
Abstract
Systems and methods for focusing a light pulse within a focus area using nonlinear photoacoustic wavefront shaping (PAWS) are disclosed herein. The method includes modulating a spatial phase pattern of a light pulse's waveform based on a Grueneisen-relaxation photoacoustic (GR-PA) feedback signal. In addition, systems and methods for performing Grueneisen-relaxation photoacoustic microscopy (GR-PAM) are disclosed herein that include analyzing photoacoustic signals resulting from illumination of a focus region by two closely spaced light pulses. A method of obtaining an absorption coefficient of a sample using Grueneisen-relaxation photoacoustic microscopy (GR-PAM) is also disclosed.