The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 05, 2021

Filed:

Dec. 21, 2018
Applicant:

Kps Co., Ltd., Hwaseong-si, KR;

Inventor:

Jung Ho Kim, Hwaseong-si, KR;

Assignee:

KPS CO., LTD., Hwaseong-si, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05C 11/11 (2006.01); C23C 14/04 (2006.01); G03F 7/20 (2006.01); H01L 51/00 (2006.01);
U.S. Cl.
CPC ...
C23C 14/042 (2013.01); G03F 7/2063 (2013.01); H01L 51/0011 (2013.01);
Abstract

Disclosed herein is a full-size mask assembly and a manufacturing method thereof. The full-size mask assembly according to an embodiment of the present invention includes a frame having a frame opening formed therein and a support surrounding the frame opening, a structural auxiliary mask supported by the support and having a plurality of shafts in a grid shape to form a plurality of structural auxiliary mask openings, and a plurality of cell unit masks supported by the structural auxiliary mask and each of which has a deposition pattern portion through which a deposition material passes.


Find Patent Forward Citations

Kim, Jung. (2021). Full-size mask assembly and manufacturing method thereof (U.S. Patent No. 11136663). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11136663

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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