The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 05, 2021
Filed:
May. 16, 2019
Nantero, Inc., Woburn, MA (US);
Joseph James McDermott, Watertown, MA (US);
Jennifer Black, Woburn, MA (US);
Rahul Sen, Lexington, MA (US);
David A. Roberts, Woburn, MA (US);
Billy Smith, Woburn, MA (US);
Other;
Abstract
Methods for forming a nanotube fabric with a controlled surface roughness (or smoothness) and a selected degree of rafting are disclosed by adjusting the concentration levels of a selected ionic species within a nanotube formulation used to form the nanotube fabric. In one aspect, the present disclosure provides a nanotube formulation roughness curve (and methods for generating such a curve) that can be used to select a utilizable range of ionic species concentration levels that will provide a nanotube fabric with a desired surface roughness (or smoothness) and degree of rafting. In some aspects of the present disclosure, such a nanotube formulation roughness curve can be used adjust nanotube formulation prior to a nanotube formulation deposition process to provide nanotube fabrics that are relatively smooth with a low degree of rafting.