The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 05, 2021

Filed:

Jun. 14, 2017
Applicant:

Daikin Industries, Ltd., Osaka, JP;

Inventors:

Tsuneo Yamashita, Osaka, JP;

Eiji Sakamoto, Osaka, JP;

Kakeru Hanabusa, Osaka, JP;

Saya Nil, Osaka, JP;

Takayuki Araki, Osaka, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B29C 59/04 (2006.01); B29C 33/62 (2006.01); B29C 35/08 (2006.01); C08G 65/00 (2006.01); C08G 65/336 (2006.01); H01L 21/027 (2006.01); B29C 59/02 (2006.01); B29K 71/00 (2006.01);
U.S. Cl.
CPC ...
B29C 59/04 (2013.01); B29C 33/62 (2013.01); B29C 35/0805 (2013.01); B29C 59/02 (2013.01); C08G 65/007 (2013.01); C08G 65/336 (2013.01); H01L 21/027 (2013.01); B29K 2071/00 (2013.01);
Abstract

The invention provides a method for producing a transfer target which is less likely to separate from a substrate or adhere to a mold even when transfer is repeated. The production method includes the steps of: (1) applying a composition containing a fluoropolyether to a release layer of a mold having an uneven pattern on a surface thereof; (2) pressing the mold to a transfer target and transferring the uneven pattern; and (3) releasing the mold from the transfer target, thereby providing the transfer target having a transferred pattern.


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