The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 05, 2021
Filed:
Apr. 09, 2019
Applicant:
Semes Co., Ltd., Cheonan-si, KR;
Inventors:
Mi Young Jo, Hwaseong-si, KR;
Da Jeong Kim, Seoul, KR;
Ye Rim Yeon, Hwaseong-si, KR;
Jun Taek Koo, Incheon, KR;
Assignee:
SEMES CO., LTD., Cheonan-si, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B 7/00 (2006.01); H01L 21/02 (2006.01); H01L 21/67 (2006.01); B08B 3/10 (2006.01); H01L 21/324 (2006.01);
U.S. Cl.
CPC ...
B08B 7/0014 (2013.01); B08B 3/10 (2013.01); H01L 21/02041 (2013.01); H01L 21/324 (2013.01); H01L 21/67051 (2013.01); H01L 21/67109 (2013.01);
Abstract
An embodiment of the present invention provides a substrate cleaning method including: supplying of a liquid cleaning solution containing a thermoreactive polymer resin in a solvent to a substrate; trapping of particles by gelling the liquid cleaning solution by phase transition through first heat treatment; liquefying of the gel-state cleaning solution with the particle trapped therein by phase transition through second heat treatment; and removing of the liquefied cleaning solution by supplying a rinse solution.