The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 05, 2021
Filed:
Mar. 26, 2021
Yifei Jenny Jin, Beijing, CN;
Naixin Angela Tang, Beijing, CN;
Liangxi Nick Chen, Beijing, CN;
Songhe Bill Shen, Beijing, CN;
Lisa Ruosha Wang, Belle Mead, NJ (US);
Richard Prince Wang, Belle Mead, NJ (US);
Jian Jim Wang, Belle Mead, NJ (US);
Qing YE, Los Gatos, CA (US);
Yifei Jenny Jin, Beijing, CN;
Naixin Angela Tang, Beijing, CN;
Liangxi Nick Chen, Beijing, CN;
Songhe Bill Shen, Beijing, CN;
Lisa Ruosha Wang, Belle Mead, NJ (US);
Richard Prince Wang, Belle Mead, NJ (US);
Jian Jim Wang, Belle Mead, NJ (US);
Qing Ye, Los Gatos, CA (US);
Other;
Abstract
A flexible method to provide a variety of value-added coatings to a piece of jewelry or a group of jewelries is disclosed. Atomic Layer Deposition (ALD) and Molecular Layer Deposition (MLD) technique is implemented to deposit a layer of conformal coating on intended jewelry surfaces, including both exterior and interior surfaces, to enhance a vast majority of process-driven or end of use driven properties. The coating compositions include dielectrics material, metals, organic materials or organic-inorganic hybrid materials. The method steps of forming a layer of coating are straightforward and can be tailed to different purposes.