The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11133905 B1

PDF
Full Text
Expired
Date of Patent:
Sep. 28, 2021

Filed:

Jun. 06, 2018
Applicant:

Sony Corporation, Tokyo, JP;

Inventors:

Jin Xu, Beijing, CN;

Dongru Li, Beijing, CN;

Hang Yang, Beijing, CN;

Chaonan He, Beijing, CN;

Xiaofeng Tao, Beijing, CN;

Jianfei Cao, Beijing, CN;

Assignee:

SONY CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H04W 72/08 (2009.01); H04L 5/00 (2006.01); H04B 7/06 (2006.01); H04B 7/08 (2006.01); H04W 72/04 (2009.01);
U.S. Cl.
CPC ...
H04L 5/0048 (2013.01); H04B 7/0626 (2013.01); H04B 7/0802 (2013.01); H04L 5/001 (2013.01); H04W 72/042 (2013.01); H04W 72/085 (2013.01); H04W 72/044 (2013.01);
Abstract

An apparatus and a method in a wireless communication system are disclosed. The apparatus comprises a processing circuit, the processing circuit being configured to: determine an idle resource element in a P2 process and/or a P3 process based on a channel state information-reference signal (CSI-RS) mapping structure, wherein only a transmission beam is scanned in the P2 process, only a reception beam is scanned in the P3 process, and the idle resource element refers to a resource element which is not occupied by a CSI-RS in an OFDM symbol occupied by the CSI-RS; and when the P2 process and/or the P3 process is carried out, control a base station so that same uses the idle resource element to send data and/or control information to a user equipment.


Find Patent Forward Citations

Loading…