The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 28, 2021

Filed:

Nov. 30, 2017
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Ning Li, White Plains, NY (US);

Joel P. de Souza, Putnam Valley, NY (US);

Yun Seog Lee, Seoul, KR;

Devendra K. Sadana, Pleasantville, NY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01M 4/04 (2006.01); H01L 21/762 (2006.01); H01M 4/36 (2006.01); G06N 3/063 (2006.01); H01M 10/04 (2006.01); H01M 4/64 (2006.01); H01M 10/42 (2006.01); H01M 10/052 (2010.01); H01M 10/0585 (2010.01); H01M 50/10 (2021.01); H01M 50/46 (2021.01); H01M 50/116 (2021.01); G11C 5/14 (2006.01);
U.S. Cl.
CPC ...
H01M 4/04 (2013.01); G06N 3/063 (2013.01); H01L 21/7624 (2013.01); H01M 4/36 (2013.01); H01M 4/64 (2013.01); H01M 10/04 (2013.01); H01M 10/0436 (2013.01); H01M 10/052 (2013.01); H01M 10/0585 (2013.01); H01M 10/4235 (2013.01); H01M 50/10 (2021.01); H01M 50/116 (2021.01); H01M 50/46 (2021.01); G11C 5/141 (2013.01); H01M 2010/0495 (2013.01); H01M 2220/20 (2013.01);
Abstract

A semiconductor structure is provided that contains a non-volatile battery which controls gate bias. The non-volatile battery has a stable voltage and thus the structure may be used in neuromorphic computing. The semiconductor structure may include a semiconductor substrate including at least one channel region that is positioned between source/drain regions. A gate dielectric material is located on the channel region of the semiconductor substrate. A battery stack is located on the gate dielectric material. In accordance with the present application, the battery stack includes, an anode current collector located on the gate dielectric material, an anode region located on the anode current collector, an ion diffusion barrier material located on the anode region, an electrolyte located on the ion diffusion barrier material, a cathode material located on the electrolyte, and a cathode current collector located on the cathode material.


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