The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 28, 2021
Filed:
Mar. 29, 2017
Nissan Chemical Corporation, Tokyo, JP;
Yuki Usui, Toyama, JP;
Takahiro Kishioka, Toyama, JP;
Yasushi Sakaida, Toyama, JP;
Hiroto Ogata, Toyama, JP;
NISSAN CHEMICAL CORPORATION, Tokyo, JP;
Abstract
The invention provides a resist underlayer film forming composition which contains a compound having a glycoluril skeleton and which prevents collapse of a resist pattern formed on a substrate in a lithography process during semiconductor production; a resist underlayer film which uses this composition; and a method for producing a semiconductor device. The compound is of formula (1-1), wherein each of R-Rrepresents a C-Calkyl group wherein a hydrogen atom is substituted by at least one substituent selected from the group consisting of a hydroxy group, a thiol group, a carboxyl group, C-Calkoxyethyl groups, C-Calkylsulfanyl groups and organic groups containing an ester bond, or a C-Calkenyl group; the R-Rmoieties may be the same as or different from each other; and each of Rand Rrepresents a hydrogen atom or a group selected from among C-Calkyl groups and a phenyl group.