The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 28, 2021

Filed:

Feb. 15, 2016
Applicant:

Oerlikon Surface Solutions Ag, Pfaffikon, Pfaffikon SZ, CH;

Inventors:

Dong-Ju Kim, Jeollabuk-do, KR;

Christian Keplinger, Meiningen, AT;

Armin Vester, Geisenheim, DE;

Jurgen Becker, Geisenheim, DE;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 16/458 (2006.01); H01J 37/32 (2006.01); C23C 14/50 (2006.01); C23C 16/50 (2006.01);
U.S. Cl.
CPC ...
C23C 16/4581 (2013.01); C23C 14/505 (2013.01); C23C 16/50 (2013.01); H01J 37/32715 (2013.01); H01J 2237/3321 (2013.01);
Abstract

A method for using a fixture system and a fixture system for holding workpieces or parts to be treated by a plasma assisted vacuum process, the fixture system including magnetic means which generate a magnetic field with a magnetic force which is high enough for holding the workpiece or part. The magnetic means of the fixture system are designed and arranged in such a manner that magnetic field lines of the generated magnetic field are largely confined to the space including the fixture system and the body of the workpiece or part, so that a generation of unintended plasma inhomogeneities caused by the magnetic field lines is avoided.


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