The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 28, 2021
Filed:
Aug. 14, 2018
Applicant:
Viavi Solutions Inc., San Jose, CA (US);
Inventors:
Andrew Clark, Santa Rosa, CA (US);
Georg J. Ockenfuss, Santa Rosa, CA (US);
Assignee:
VIAVI Solutions Inc., San Jose, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/34 (2006.01); C23C 14/35 (2006.01); C23C 14/00 (2006.01); C23C 14/10 (2006.01); C23C 14/14 (2006.01);
U.S. Cl.
CPC ...
C23C 14/35 (2013.01); C23C 14/0057 (2013.01); C23C 14/10 (2013.01); C23C 14/14 (2013.01); C23C 14/3407 (2013.01);
Abstract
A sputtering system may include a substrate. The sputtering system may include at least one target. The at least one target may include at least one coating material to coat at least one layer onto the substrate. The at least one coating material may be sputtered onto the substrate in a presence of an inert gas. The inert gas may include argon gas and helium gas.