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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11130985 B1

PDFFull Text
Expired
Date of Patent:
Sep. 28, 2021

Filed:

Oct. 07, 2015

Spot array substrate, method for producing same, and nucleic acid polymer analysis method and device

Applicant:

Hitachi High-technologies Corporation, Tokyo, JP;

Inventors:

Naoshi Itabashi, Tokyo, JP;

Sonoko Migitaka, Tokyo, JP;

Masatoshi Narahara, Tokyo, JP;

Tomohiro Shoji, Tokyo, JP;

Yukio Ono, Tokyo, JP;

Assignee:

HITACHI HIGH-TECH CORPORATION, Tokyo, JP;

Attorney:

Mattingly & Malur, PC

Primary Examiner:

Betty J Forman

Int. Cl.
CPC ...
C12Q 1/68 (2018.01); C12Q 1/6809 (2018.01); B01J 19/00 (2006.01); C12Q 1/6806 (2018.01); C12Q 1/6874 (2018.01); G01N 35/00 (2006.01); G01N 35/10 (2006.01); B32B 27/32 (2006.01); C08G 77/50 (2006.01);
U.S. Cl.
CPC ...
C12Q 1/6809 (2013.01); B01J 19/0046 (2013.01); C12Q 1/6806 (2013.01); C12Q 1/6874 (2013.01); B01J 2219/00421 (2013.01); B01J 2219/00466 (2013.01); B01J 2219/00621 (2013.01); B01J 2219/00648 (2013.01); B01J 2219/00659 (2013.01); B01J 2219/00722 (2013.01); B32B 27/32 (2013.01); C08G 77/50 (2013.01); G01N 2035/00237 (2013.01); G01N 2035/1034 (2013.01);
Abstract

In order to reduce the cost of producing a spot array substrate and reduce the cost of nucleic acid polymer analysis, a spot array substrate is used which is produced by preparing a resin substratehaving a surface on which an uneven pattern is formed and a plurality of bead sitting positions set in a two-dimensional array within the uneven pattern, and loading surface-modified beads onto the bead sitting positions of the resin substrate.

Find Patent Forward Citations

Itabashi, Naoshi. (2021). Spot array substrate, method for producing same, and nucleic acid polymer analysis method and device (U.S. Patent No. 11130985). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11130985

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