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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11127902 B1

PDFFull Text
Date of Patent:
Sep. 21, 2021

Filed:

Aug. 23, 2019

Organic light-emitting display apparatus and method of manufacturing the same

Applicant:

Samsung Display Co., Ltd., Yongin-si, KR;

Inventors:

Arong Kim, Yongin-si, KR;

Jungsun Park, Yongin-si, KR;

Hyunsung Bang, Yongin-si, KR;

Duckjung Lee, Yongin-si, KR;

Jiyoung Choung, Yongin-si, KR;

Assignee:

Samsung Display Co., Ltd., Yongin-si, KR;

Attorney:

H.C. Park & Associates, PLC

Primary Examiner:

Farun Lu

Int. Cl.
CPC ...
H01L 51/00 (2006.01); G03F 7/09 (2006.01); G03F 7/095 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01); G03F 7/26 (2006.01); H01L 51/56 (2006.01); H01L 27/32 (2006.01); H01L 51/52 (2006.01); H01L 51/50 (2006.01);
U.S. Cl.
CPC ...
H01L 51/0016 (2013.01); G03F 7/094 (2013.01); G03F 7/095 (2013.01); G03F 7/16 (2013.01); G03F 7/20 (2013.01); G03F 7/2022 (2013.01); G03F 7/26 (2013.01); H01L 51/56 (2013.01); H01L 27/3211 (2013.01); H01L 27/3246 (2013.01); H01L 51/5012 (2013.01); H01L 51/5056 (2013.01); H01L 51/5072 (2013.01); H01L 51/5088 (2013.01); H01L 51/5092 (2013.01); H01L 51/5206 (2013.01); H01L 51/5228 (2013.01);
Abstract

A method of manufacturing an organic light-emitting display apparatus including forming a lift-off layer on a substrate including a first electrode, the lift-off layer including a fluoropolymer; sequentially forming a barrier layer and a photoresist on the lift-off layer, the barrier layer including an inorganic material; patterning the photoresist and the barrier layer to remove a first portion of the photoresist corresponding to the first electrode such that a second portion other than the first portion remains; etching a portion of the lift-off layer corresponding to the first portion to expose the first electrode; forming an organic functional layer and an auxiliary electrode over the first electrode and the second portion of the photoresist, the organic functional layer including an emission layer; and removing the lift-off layer, the barrier layer, the photoresist, the organic functional layer, and the auxiliary electrode remaining on the second portion.

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