The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 21, 2021

Filed:

Jul. 09, 2018
Applicant:

Beijing Tongmei Xtal Technology Co., Ltd., Beijing, CN;

Inventors:

Rajaram Shetty, Fremont, CA (US);

Yuanli Wang, Beijing, CN;

Yvonne Zhou, Fremont, CA (US);

Weiguo Liu, Fremont, CA (US);

Sung-Nee George Chu, Fremont, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C30B 29/08 (2006.01); H01L 31/0288 (2006.01); C30B 11/00 (2006.01); C30B 33/00 (2006.01); H01L 31/0687 (2012.01); H01L 31/18 (2006.01);
U.S. Cl.
CPC ...
H01L 31/0288 (2013.01); C30B 11/006 (2013.01); C30B 29/08 (2013.01); C30B 33/00 (2013.01); H01L 31/0687 (2013.01); H01L 31/1828 (2013.01);
Abstract

A monocrystalline germanium wafer that increases the open-circuit voltage of multijunction solar cells, a method for preparing the monocrystalline germanium wafer and a method for preparing an ingot from which the monocrystalline germanium wafer is prepared. The monocrystalline germanium wafer that increases the open-circuit voltage of the bottom cell of multijunction solar cells is prepared by adjusting the amounts of the co-dopants silicon and gallium in the monocrystalline germanium wafer, the ratio of silicon to gallium in the preparation of the monocrystalline germanium.


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