The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 21, 2021
Filed:
May. 21, 2019
Applicant:
Spts Technologies Limited, Newport, GB;
Inventors:
Stephen R. Burgess, Gwent, GB;
Anthony Paul Wilby, Bristol, GB;
Assignee:
SPTS Technologies Limited, Newport, GB;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/34 (2006.01); H01J 37/32 (2006.01); C23C 14/04 (2006.01); H01J 37/34 (2006.01); H01J 37/18 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32467 (2013.01); C23C 14/046 (2013.01); C23C 14/34 (2013.01); H01J 37/18 (2013.01); H01J 37/321 (2013.01); H01J 37/32862 (2013.01); H01J 37/34 (2013.01);
Abstract
A method is for cleaning a plasma etching apparatus of the type used to etch a substrate and having at least one chamber. The method includes sputtering a metallic material from an electrically conductive coil which is positioned within the at least one chamber onto an interior surface of the at least one chamber to perform a cleaning function.