The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 21, 2021

Filed:

May. 03, 2018
Applicant:

Eth Zurich, Zurich, CH;

Inventors:

Hyung Gyu Park, Gyeongbuk, KR;

Ali Altun, Zürich, CH;

Assignee:

ETH ZURICH, Zurich, CH;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/65 (2006.01); G01N 1/28 (2006.01);
U.S. Cl.
CPC ...
G01N 21/658 (2013.01); G01N 1/2813 (2013.01); G01N 2021/651 (2013.01);
Abstract

A method for analysing an analyte () using surface enhanced Raman spectroscopy (SERS), comprising the following steps: (a) providing an essentially flat or topologically structured metal surface () of a SERS-active metal; (b) depositing the analyte () or an open pore matrix material () on the surface (); (c) depositing a multitude of nano-droplets () of a SERS-active metal on top of the analyte () or the open pore matrix material (), respectively; and (d) spectroscopically analysing, by scanning laser irradiation and using SERS, the analyte sandwiched between the surface () and the multitude of nano-droplets (). The diameter of the nano-droplets () is in the range of 5-70 nm, and the distance between adjacent nano-droplets () is smaller than their diameter, and wherein step c) is carried out by PVD or by sputtering SERS-active metal.


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