The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 21, 2021
Filed:
Aug. 11, 2017
General Electric Company, Schenectady, NY (US);
Zirong Zahi, Skaneateles, NY (US);
Kevin George Harding, Niskayuna, NY (US);
Jie Han, Shanghai, CN;
Dongmin Yang, Skaneateles, NY (US);
Clark Alexander Bendall, Skaneateles, NY (US);
Jijun Gu, Shanghai, CN;
BAKER HUGHES, A GE COMPANY, LLC, Houston, TX (US);
Abstract
A probe system and a method are provided. The probe system includes an emitter unit, a pattern generation system, and an intensity modulator. The emitter unit is for emitting light. The pattern generation system is for projecting at least one reference structured-light pattern onto an object surface to obtain at least one reference projected pattern, and including a mirror scanning unit for reflecting the light to a plurality of directions. The intensity modulator is for modulating intensity of the light according to the at least one reference projected pattern to provide modulated light to the mirror scanning unit to reflect the modulated light to the plurality of directions to project at least one modulated structured-light pattern onto the object surface to obtain at least one modulated projected pattern.