The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 21, 2021

Filed:

Mar. 29, 2017
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Jianqi Wang, Fremont, CA (US);

Joung Woo Lee, Singapore, SG;

Gia Pham, San Jose, CA (US);

Alex Gerrard, San Jose, CA (US);

Robert C. McIntosh, San Jose, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
F28F 19/00 (2006.01); H01L 21/67 (2006.01); C09K 5/10 (2006.01); F28F 23/00 (2006.01);
U.S. Cl.
CPC ...
F28F 19/00 (2013.01); C09K 5/10 (2013.01); F28F 23/00 (2013.01); H01L 21/67098 (2013.01); H01L 21/67109 (2013.01); H01L 21/67253 (2013.01);
Abstract

Implementations described herein generally relate to substrate processing equipment and more particularly to methods and compositions for temperature control of substrate processing equipment. In one implementation, a method of cooling a processing chamber component is provided. The method comprises introducing an inert purge gas into a supply reservoir containing a coolant and flowing the treated coolant to a processing chamber component to cool the processing chamber component. The coolant initially comprises deionized water and a water-soluble base.


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