The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11124864 B1

PDF
Full Text
Expired
Date of Patent:
Sep. 21, 2021

Filed:

May. 20, 2019
Applicant:

Birmingham Technologies, Inc., Arlington, VA (US);

Inventor:

Joseph G. Birmingham, Arlington, VA (US);

Assignee:

BIRMINGHAM TECHNOLOGIES, INC., Arlington, VA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 4/06 (2016.01); C23C 4/123 (2016.01); C23C 4/10 (2016.01); B01J 13/02 (2006.01); C04B 35/622 (2006.01); C01B 32/956 (2017.01);
U.S. Cl.
CPC ...
C23C 4/06 (2013.01); B01J 13/02 (2013.01); C01B 32/956 (2017.08); C04B 35/62222 (2013.01); C23C 4/10 (2013.01); C23C 4/123 (2016.01);
Abstract

Embodiments relate to a method of manufacturing pinned nano-structures with tailored gradient properties. First and second compositions are provided, Each of the compositions includes a nano-structural material, a plurality of grain growth inhibitor nano-particles, and at least one of a tailoring solute and a plurality of tailoring nano-particles. Deposition layers are formed proximal to a substrate with each of the compositions through electrospray techniques.


Find Patent Forward Citations

Birmingham, Joseph. (2021). Method of fabricating nano-structures with engineered nano-scale electrospray depositions (U.S. Patent No. 11124864). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11124864

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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