The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 21, 2021

Filed:

Sep. 20, 2018
Applicant:

Lg Chem, Ltd., Seoul, KR;

Inventors:

Hyeok Jeong, Daejeon, KR;

Taekeun Kim, Daejeon, KR;

Jinkyu Lee, Daejeon, KR;

Mingoo Kim, Daejeon, KR;

Assignee:

LG CHEM, LTD., Seoul, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08G 77/38 (2006.01); C09D 5/14 (2006.01); C09D 7/40 (2018.01); C08J 5/18 (2006.01); C08K 5/00 (2006.01); C08K 5/3415 (2006.01); C08L 63/00 (2006.01); C09D 183/04 (2006.01);
U.S. Cl.
CPC ...
C09D 5/14 (2013.01); C08G 77/38 (2013.01); C08J 5/18 (2013.01); C08K 5/0058 (2013.01); C08K 5/3415 (2013.01); C08L 63/00 (2013.01); C09D 7/40 (2018.01); C09D 183/04 (2013.01); C08L 2203/20 (2013.01); C08L 2312/00 (2013.01);
Abstract

An antimicrobial polymer coating composition comprising a polyhedral oligomeric silsesquioxane having a cage structure and having one or more reactive functional groups substituted on silicon atoms; a thermal initiator; and a photosensitizer, an antimicrobial polymer film comprising a cured product of the antimicrobial polymer coating composition, and an antimicrobial polymer film comprising: a substrate layer containing a polyhedral oligomeric silsesquioxane having a cage structure, in which one or more reactive functional groups are substituted; and a photosensitizes dispersed in the substrate layer, wherein the polymer film has oxygen permeability of 10 to 80 cc/mday.


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