The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 21, 2021
Filed:
Nov. 24, 2020
Iowa State University Research Foundation, Inc., Ames, IA (US);
James E. Fay, III, Boulder, CO (US);
Richard Dennis Vigil, Ames, IA (US);
John A. Soderquist, Dorado, PR (US);
Andrew S. Heller, Ames, IA (US);
Trung Lo Deo, Urbandale, IA (US);
Cameron Lynch, Iowa City, IA (US);
Danilo R. Manfre, West Des Moines, IA (US);
Beate Schmittmann, Ames, IA (US);
Iowa State University Research Foundation, Inc., Ames, IA (US);
Abstract
An entrainment-based filtering system for use in connection with a facemask or respirator that includes: a filter housing defining an interior volume comprising at least one airflow pathway having an airflow pathway length that is longer than the length of the interior volume and spaced within the interior volume; and a plurality of entrainment substrates. The plurality of entrainment substrates is positioned within the at least one airflow pathway and the plurality of substrates and the dimensions of the at least one airflow pathway together function to entrain particles on the surface of the chemically coated entrainment substrates and prevent at least 95% of particles traveling through the at least one airflow pathway from exiting the entrainment-based filter.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile