The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 14, 2021

Filed:

Oct. 30, 2018
Applicant:

Maxwell Technologies, Inc., San Diego, CA (US);

Inventor:

Porter Mitchell, Chandler, AZ (US);

Assignee:

Maxwell Technologies, Inc., San Diego, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01M 4/04 (2006.01); H01M 4/62 (2006.01); H01M 4/587 (2010.01); H01M 4/38 (2006.01); H01G 11/46 (2013.01); H01G 11/86 (2013.01); H01G 11/36 (2013.01); H01G 11/50 (2013.01); H01G 11/44 (2013.01); H01M 4/485 (2010.01); H01M 4/139 (2010.01); H01M 4/583 (2010.01); H01M 4/1393 (2010.01); H01M 4/1395 (2010.01); H01M 4/1391 (2010.01);
U.S. Cl.
CPC ...
H01M 4/0402 (2013.01); H01G 11/36 (2013.01); H01G 11/44 (2013.01); H01G 11/46 (2013.01); H01G 11/50 (2013.01); H01G 11/86 (2013.01); H01M 4/0404 (2013.01); H01M 4/139 (2013.01); H01M 4/1391 (2013.01); H01M 4/1393 (2013.01); H01M 4/1395 (2013.01); H01M 4/38 (2013.01); H01M 4/485 (2013.01); H01M 4/583 (2013.01); H01M 4/587 (2013.01); H01M 4/623 (2013.01);
Abstract

Apparatuses and methods for forming an electrode film mixture are described. An apparatus for forming an electrode film mixture can have a first source including a solution comprising a polymer, for example, polytetrafluoroethylene and a critical or supercritical fluid, for example, supercritical carbon dioxide, a second source including a second component of the electrode film mixture, a mixer configured to receive the solution and the second component and to form a slurry comprising the solution and the second component. The apparatus can include a decompressor configured to receive the slurry and decompress the slurry to vaporize the critical or supercritical fluid and precipitate dry polymer.


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