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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11121321 B1

PDFFull Text
Date of Patent:
Sep. 14, 2021

Filed:

Nov. 01, 2018

High resolution shadow mask with tapered pixel openings

Applicant:

Emagin Corporation, Hopewell Junction, NY (US);

Inventors:

Evan P. Donoghue, Hopewell Junction, NY (US);

Ilyas I. Khayrullin, Hopewell Junction, NY (US);

Kerry Tice, Hopewell Junction, NY (US);

Tariq Ali, Hopewell Junction, NY (US);

Qi Wang, Hopewell Junction, NY (US);

Fridrich Vazan, Pittsford, NY (US);

Amalkumar P. Ghosh, Hopewell Junction, NY (US);

Assignee:

eMagin Corporation, Hopewell Junction, NY (US);

Attorney:

Kaplan Breyer Schwarz, LLP

Primary Examiner:

Brian Turner

Int. Cl.
CPC ...
C23C 14/04 (2006.01); C23C 14/24 (2006.01); H01J 1/62 (2006.01); B23K 26/364 (2014.01); H01L 51/00 (2006.01); H01L 51/56 (2006.01); H01L 27/32 (2006.01);
U.S. Cl.
CPC ...
H01L 51/0011 (2013.01); C23C 14/042 (2013.01); H01L 27/3244 (2013.01); H01L 51/001 (2013.01); H01L 51/56 (2013.01);
Abstract

Aspects of the present disclosure are directed to systems, method, and structures including a high-resolution shadow mask with tapered aperture/pixel openings that advantageously overcomes problems plaguing the prior art namely shadowing, sagging, and fragility.

Find Patent Forward Citations

Quick Actions:

Donoghue, Evan. (2021). High resolution shadow mask with tapered pixel openings (U.S. Patent No. 11121321). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11121321

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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