The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 14, 2021

Filed:

Mar. 03, 2014
Applicant:

Board of Trustees of the University of Arkansas, Little Rock, AR (US);

Inventors:

Min Zou, Fayetteville, AR (US);

Corey Thompson, Springdale, AR (US);

Robert A. Fleming, Fayetteville, AR (US);

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 31/0216 (2014.01); G02B 1/118 (2015.01); C03C 17/42 (2006.01); C03C 17/00 (2006.01); C03C 17/32 (2006.01);
U.S. Cl.
CPC ...
H01L 31/02168 (2013.01); C03C 17/001 (2013.01); C03C 17/32 (2013.01); C03C 17/42 (2013.01); G02B 1/118 (2013.01); C03C 2217/734 (2013.01);
Abstract

One aspect of the disclosure is directed to a method for forming an antireflective coating on a substrate, which includes providing a polymer solution and a silica solution, depositing the polymer solution on a surface of the substrate to forming a polymer film thereon, depositing the silica solution on the formed polymer film on the substrate to form a silica film thereon, thereby forming a stack structure having the silica film formed on the polymer film that is, in turn, formed on the substrate, and drying the stack structure to form the antireflective coating on the substrate, wherein the antireflective coating comprises silica nanoparticles.


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