The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 14, 2021
Filed:
Oct. 08, 2019
Applicant:
Nth Tech Corporation, Churchville, NY (US);
Inventor:
Michael D. Potter, Churchville, NY (US);
Assignee:
NTH TECH CORPORATION, Churchville, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); H01L 29/66 (2006.01); H01L 21/28 (2006.01); H01L 29/51 (2006.01); H01L 29/792 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02164 (2013.01); H01L 21/02181 (2013.01); H01L 21/02205 (2013.01); H01L 21/02208 (2013.01); H01L 21/02271 (2013.01); H01L 29/40117 (2019.08); H01L 29/513 (2013.01); H01L 29/517 (2013.01); H01L 29/66833 (2013.01); H01L 29/7923 (2013.01);
Abstract
A method and resulting structure that includes depositing two or more elements on a substrate. A rate of one of the two or more elements provided during the depositing is restricted to target where one or more energy levels are set within a bandgap of a nonstoichiometric structure generated by the depositing. The generated nonstoichiometric bandgap structure with the one or more set energy levels within the bandgap is provided.