The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 14, 2021

Filed:

Mar. 24, 2020
Applicant:

Samsung Electronics Co., Ltd., Suwon-si, KR;

Inventors:

Anders M. Kugler, Campbell, CA (US);

Aayush Ankit, West Lafayette, IN (US);

Wilson Wai Lun Fung, Milpitas, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 15/04 (2011.01); G06T 1/20 (2006.01); G06T 15/50 (2011.01); G06T 1/60 (2006.01);
U.S. Cl.
CPC ...
G06T 15/04 (2013.01); G06T 1/20 (2013.01); G06T 1/60 (2013.01); G06T 15/503 (2013.01); G06T 2210/36 (2013.01);
Abstract

A texture filtering unit and a method are disclosed that provide multiple variants of an approximate trilinear filtering operation. A texture sampling and filtering unit may be configured to determine a level-of-detail (LOD) value for a sample point in texture space, and select, based on the LOD value, a fine mip-level and a coarse mip-level from the mip-map. The closer of the two selected mip-levels to the sample point is determined, and farther of the two selected mip-levels from the sample point is determined. A first quad of texels in the closer mip-level and a second quad of texels in the farther mip-level are then determined. A total of five or fewer texels are selected from the first quad of texels and from the second quad of texels. A filtered value for the sample point is determined based on an approximate trilinear filtering operation on the selected texels.


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