The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 14, 2021

Filed:

Aug. 12, 2019
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Bo Zhang, Cary, NC (US);

Xianjun Zhu, Cary, NC (US);

Bradley C. Herrin, Austin, TX (US);

Liwei Wang, Cary, NC (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G06F 9/44 (2018.01); G06F 8/73 (2018.01); G06N 5/02 (2006.01); G06F 16/2458 (2019.01);
U.S. Cl.
CPC ...
G06F 8/73 (2013.01); G06F 16/2465 (2019.01); G06N 5/025 (2013.01); G06F 2216/03 (2013.01);
Abstract

A computer-implemented method, system and computer program product for identifying implicit dependencies between code artifacts. Co-defect association rules between code artifacts are generated, where such co-defect association rules include a prediction of how likely there will be a defect in a code artifact when there is a defect in an associated code artifact. After detecting a defect in a first code artifact, the co-defect association rules are reviewed to identify any code artifacts associated with the first code artifact. If there is a code artifact associated with the first code artifact, and if the probability of the associated code artifact being defected when the first code artifact is defected exceeds a threshold value, then a recommendation is made to the user to review not only the first code artifact that was defected but also its associated code artifact for a potential defect.


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