The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 14, 2021
Filed:
Nov. 05, 2019
Applicant:
Shin-etsu Chemical Co., Ltd., Tokyo, JP;
Inventors:
Hitoshi Maruyama, Annaka, JP;
Kyoko Soga, Annaka, JP;
Assignee:
SHIN-ETSU CHEMICAL CO., LTD., Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/075 (2006.01); C08G 77/48 (2006.01); C08G 77/14 (2006.01); C08K 5/00 (2006.01); C08L 83/06 (2006.01); G03F 7/00 (2006.01); H01L 29/12 (2006.01); C09D 183/14 (2006.01); G03F 7/32 (2006.01); G03F 7/038 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0757 (2013.01); C08G 77/14 (2013.01); C08G 77/48 (2013.01); C08K 5/005 (2013.01); C08K 5/0025 (2013.01); C08L 83/06 (2013.01); C09D 183/14 (2013.01); G03F 7/0005 (2013.01); G03F 7/32 (2013.01); H01L 29/12 (2013.01); C08L 2201/08 (2013.01); C08L 2201/10 (2013.01); C08L 2203/16 (2013.01); C08L 2203/20 (2013.01); C08L 2312/06 (2013.01); G03F 7/0382 (2013.01);
Abstract
A polymer comprising polysiloxane, silphenylene, isocyanuric acid, and norbornene skeletons in a backbone and having an epoxy group in a side chain is provided. A photosensitive resin composition comprising the polymer and a photoacid generator is coated to form a film which can be patterned using radiation of widely varying wavelength. The patterned film has high transparency, light resistance, and heat resistance.