The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 14, 2021

Filed:

Jun. 11, 2020
Applicant:

Spintech, Inc., Bingham Farms, MI (US);

Inventors:

E. Mark Haacke, Detroit, MI (US);

Yongsheng Chen, Detroit, MI (US);

Assignee:

SPINTECH, INC., Bingham Farms, MI (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01R 33/48 (2006.01); G01R 33/561 (2006.01); G01R 33/56 (2006.01);
U.S. Cl.
CPC ...
G01R 33/4826 (2013.01); G01R 33/5608 (2013.01); G01R 33/5613 (2013.01); G01R 33/5615 (2013.01);
Abstract

Systems and methods for high-resolution STAGE imaging can include acquisition of relatively low-resolution k-space datasets with two separate multi-echo GRE sequences. The multi-echo GRE sequences can correspond to separate and distinct flip angles. Various techniques for combining the low-resolution k-space datasets to generate a relatively high-resolution k-space are described. These techniques can involve combining low-resolution k-space datasets associated with various echo types. The STAGE imaging approaches described herein allow for rapid imaging, enhanced image resolution with relatively small or no increase in MR data acquisition time.


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