The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 14, 2021

Filed:

Oct. 31, 2018
Applicant:

Korea Institute of Machinery & Materials, Daejeon, KR;

Inventors:

Sung-Gyu Park, Changwon-si, KR;

Dong-Ho Kim, Busan, KR;

Ho-Sang Jung, Gangnam-gu, KR;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B82Y 30/00 (2011.01); G01N 21/65 (2006.01); G01J 3/44 (2006.01); B81B 5/00 (2006.01); B81C 1/00 (2006.01); B82Y 40/00 (2011.01);
U.S. Cl.
CPC ...
G01N 21/658 (2013.01); B81B 5/00 (2013.01); B81C 1/00349 (2013.01); B82Y 30/00 (2013.01); B82Y 40/00 (2013.01); G01J 3/44 (2013.01);
Abstract

A substrate formed by using a sliding dielectric film with a low surface energy that activates surface migration of metal adatoms and a method of manufacturing the same. More particularly, a substrate with a sliding dielectric film includes a substrate; a sliding dielectric film with a low surface energy formed on the substrate; and a nanoparticle formed on the sliding dielectric film, wherein the surface energy of the nanoparticle is at least 1000 mJ/mgreater than the surface energy of the sliding dielectric film. The substrate has a very high SERS enhancement factor with low light loss characteristics in the entire visible region by maximizing the plasmonic coupling between highly-dense and spaced-apart nanoparticles and between the lower substrate and the upper nanoparticles.


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