The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 14, 2021

Filed:

Sep. 26, 2019
Applicant:

Olympus Corporation, Hachioji, JP;

Inventors:

Mitsushiro Yamaguchi, Tokyo, JP;

Tetsuya Tanabe, Tokyo, JP;

Assignee:

OLYMPUS CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 15/06 (2006.01); G01N 15/14 (2006.01); G02B 26/08 (2006.01); G02B 26/10 (2006.01);
U.S. Cl.
CPC ...
G01N 15/06 (2013.01); G01N 15/14 (2013.01); G01N 2015/0693 (2013.01); G02B 26/0816 (2013.01); G02B 26/101 (2013.01);
Abstract

An optical analysis device includes a light source, a beam shaping unit, a relative movement unit, a photodetector, and a position detector. The light source unit generates a light beam. The beam shaping unit forms a flat beam portion. The relative movement unit is configured to cause the flat beam portion and a test sample including marker particles to relatively move in a minor axis direction of the flat beam portion. The photodetector is configured to detect a light intensity and a light emitting position in a plane orthogonal to the minor axis direction. The position detector is capable of detecting spatial positions of the marker particles on the basis of information on a relative movement amount of the flat beam portion, information on the light intensity and the light emitting position, and a change of the light intensity generated according to a relative movement of the flat beam portion.


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