The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 14, 2021
Filed:
Feb. 14, 2018
Hrl Laboratories, Llc, Malibu, CA (US);
Michael H. Risbud Bartl, Salt Lake City, UT (US);
Alan J. Jacobsen, Woodland Hills, CA (US);
HRL Laboratories, LLC, Malibu, CA (US);
Abstract
We describe a new approach to fabricate polymeric materials with surface structures for applications as anti-reflective, anti-icing, superhydrophobic, superhydrophilic, de-wetting, and self-cleaning coatings. In some variations, a surface-textured layer comprises first microdomains and second microdomains each containing polymerized cross-linkable photomonomer, where the first microdomains have a higher average cross-link density than that of the second microdomains. The first microdomains and the second microdomains are in a peak-valley surface topology, providing surface texture with no filler particles. In some variations, a method to fabricate a surface-textured layer comprises: applying a cross-linkable photomonomer layer to a reflective substrate; exposing the photomonomer layer to a collimated light beam with no spatial variation, to initiate polymerization in first microdomains; and polymerizing other regions of the photomonomer layer to form second microdomains that are spatially separated from the first microdomains. The first microdomains have a higher average cross-link density compared to the second microdomains.