The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 14, 2021

Filed:

Apr. 09, 2020
Applicant:

Lawrence Livermore National Security, Llc, Livermore, CA (US);

Inventors:

Ryan Hensleigh, Colstrip, MT (US);

Eric B. Duoss, Danville, CA (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B33Y 50/02 (2015.01); B33Y 10/00 (2015.01); B33Y 30/00 (2015.01); B29C 64/386 (2017.01); B29C 64/20 (2017.01); B29C 64/135 (2017.01); B29C 64/124 (2017.01); B29C 64/264 (2017.01); B29C 64/393 (2017.01); B29C 64/227 (2017.01);
U.S. Cl.
CPC ...
B33Y 50/02 (2014.12); B29C 64/124 (2017.08); B29C 64/135 (2017.08); B29C 64/20 (2017.08); B29C 64/227 (2017.08); B29C 64/264 (2017.08); B29C 64/386 (2017.08); B29C 64/393 (2017.08); B33Y 10/00 (2014.12); B33Y 30/00 (2014.12);
Abstract

The present disclosure relates to a method for performing a three dimensional (3D) printing process. A primary light beam having a wavelength sufficient to initiate polymerization of a photoresin is generated and patterned into a patterned primary beam. The patterned primary beam is directed toward an ultraviolet (UV) or visible light sensitive photoresin to initiate polymerization of select areas of the photoresin. The photoresin is also illuminated with a secondary light beam having a wavelength of at least one of about 765 nm, 1064 nm, or 1273 nm. The secondary light beam stimulates triplet oxygen into singlet oxygen, which controls oxygen inhibition in additional areas bordering the select areas, to enable controlled polymerization inhibition in the additional areas bordering the select areas.


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