The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 14, 2021
Filed:
Jul. 06, 2020
Antaya Science & Technology, Hampton, NH (US);
Timothy A. Antaya, Hampton Falls, NH (US);
Antaya Science & Technology, Hampton, NH (US);
Abstract
A high-intensity external ion injector can includes (a) an ion source defining a plasma chamber and including an aperture through which ions can escape the plasma chamber, (b) a microwave source configured to generate microwave radiation and direct the microwave radiation into the plasma chamber, (c) a gas source filled with a plasma-forming gas and configured to supply the plasma-forming gas to the plasma chamber, (d) a voltage source configured to apply a voltage to the plasma chamber, (e) an einzel triplet lens, (f) an ion focus positioned and configured to focus an ion beam exiting the aperture of the ion source through the einzel triplet lens, and (g) a periodic focusing structure positioned and configured to receive an ion beam exiting the einzel triplet lens.