The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 14, 2021
Filed:
Sep. 06, 2017
D. R. Nano Co., Ltd., Seoul, KR;
Yong-Deok Lee, Namyangju-si, KR;
D. R. NANO CO., LTD., Seoul, KR;
Abstract
The present invention relates to complex particles using methylene blue for treating a skin disease caused byorand a composition for treatment including the complex particles. The complex particles in the present invention can be used as a photosensitizer for a photodynamic therapy and complex particles having a micelle form in which hydrophilic methylene blue and two hydrophobic organic acids are combined, and as a result, pore penetration is easy and an occlusion time can be significantly reduced to 30 minutes as compared with conventional phototherapy requiring an occlusion time of 1 hour to 3 hours. Further, in order to reduce side effects of a residual photosensitizer in phototherapy using an existing photosensitizer due to photoreaction and photobleaching of the methylene blue-organic acid complex, a light protection (light blocking or light shielding) time when contact of light needs to be avoided for 24 hours or more after treatment can be significantly reduced to 3 hours, and target treatment for, or the like which is a cause of acne is possible.