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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11116498 B1

PDFFull Text
Date of Patent:
Sep. 14, 2021

Filed:

Nov. 10, 2014

Variable denier yarn and suture

Applicant:

Syntorr Inc., Palo Alto, CA (US);

Inventor:

Daniel L. Martin, Palo Alto, CA (US);

Assignee:

Syntorr Inc., Palo Alto, CA (US);

Attorney:

Shay Glenn LLP

Primary Examiner:

Diane D Yabut

Assistant Examiner:

Christina C Lauer

Int. Cl.
CPC ...
A61B 17/06 (2006.01); D04C 1/12 (2006.01); D04B 1/22 (2006.01); D04B 21/20 (2006.01); A61B 17/00 (2006.01); A61F 2/06 (2013.01);
U.S. Cl.
CPC ...
A61B 17/06166 (2013.01); D04B 1/22 (2013.01); D04B 21/202 (2013.01); D04C 1/12 (2013.01); A61B 2017/00526 (2013.01); A61F 2/06 (2013.01); A61F 2002/065 (2013.01); D10B 2509/04 (2013.01);
Abstract

A method of suturing includes: (1) wrapping a first segment of a suture through a traction loop; (2) pulling the traction loop and the first segment through an opening in a suture lock; (3) continuing to pull the traction loop such that a second segment of the suture extends through the opening, wherein the second segment has a greater denier than the first segment such that the second segment more nearly fills an entire dimension of the opening than the first segment; and (4) locking the suture in place with the second segment in the opening.

Find Patent Forward Citations

Martin, Daniel. (2021). Variable denier yarn and suture (U.S. Patent No. 11116498). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11116498

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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