The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 14, 2021

Filed:

Apr. 17, 2018
Applicant:

Koninklijke Philips N.v., Eindhoven, NL;

Inventors:

Andriy Yaroshenko, Garching, DE;

Hanns-Ingo Maack, Norderstedt, DE;

Thomas Koehler, Norderstedt, NL;

Fabio De Marco, Eindhoven, NL;

Lukas Benedict Gromann, Freising, DE;

Willer Konstantin, Eindhoven, NL;

Peter Noel, Eindhoven, NL;

Assignee:

KONINKLIJKE PHILIPS N.V., Eindhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61B 6/00 (2006.01); G01T 7/00 (2006.01);
U.S. Cl.
CPC ...
A61B 6/583 (2013.01); A61B 6/4241 (2013.01); A61B 6/482 (2013.01); A61B 6/484 (2013.01); A61B 6/5258 (2013.01); G01T 7/005 (2013.01);
Abstract

The invention relates to beam hardening correction in X-ray Dark-Field imaging of a subject including a first material and a second material, the first and second material having different beam hardening properties. As the X-ray imaging data includes information on the internal structure of the imaged subject, such information may be used, together with appropriate calibration data to identify the beam hardening contributions occurring in the imaged area of the subject, so to allow for a correction of artifacts due to beam hardening in X-ray Dark-Field imaging.


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