The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 07, 2021

Filed:

Jan. 16, 2015
Applicant:

Bum Je Woo, Seongnam-si, KR;

Inventors:

Bum Je Woo, Seongnam-si, KR;

Sang Hyun Kim, Yongin-si, KR;

Myoung Sok Han, Yongin-si, KR;

Young Chul Kim, Yongin-si, KR;

Assignee:

Other;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/673 (2006.01); H01L 21/677 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67389 (2013.01); H01L 21/6732 (2013.01); H01L 21/67383 (2013.01); H01L 21/67393 (2013.01); H01L 21/67724 (2013.01);
Abstract

The present invention relates to an apparatus for removing fume which includes, a wafer cassette for stacking wafers; and an exhaust for exhausting the fume of the wafers stacked in the wafer cassette, wherein the wafer cassette includes stacking shelves provided at both sides for stacking wafers; and a front opening for incoming and outgoing of the wafers which are being stacked in the stacking shelf, wherein the stacking shelves include multiple inclined ramp portions which are slanted towards the wafers stacked in the stacking shelves as they travel towards the front opening, wherein a purge gas outlet is provided in the inclined ramp portion for supplying purge gas for the wafers stacked in the stacking shelves. According to the present invention, the residual process gases on wafers can be removed efficiently.


Find Patent Forward Citations

Loading…