The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 07, 2021
Filed:
Jul. 14, 2017
The Japan Steel Works, Ltd., Tokyo, JP;
Kenichi Ohmori, Yokohama, JP;
Suk-Hwan Chung, Yokohama, JP;
Ryosuke Sato, Yokohama, JP;
Masashi Machida, Yokohama, JP;
THE JAPAN STEEL WORKS, LTD., Tokyo, JP;
Abstract
A laser annealing apparatus () according to the embodiment includes: a laser beam source () configured to emit a laser beam (L) to crystallize an amorphous silicon film () on a substrate () and to form a poly-silicon film (); a projection lens () configured to condense the laser beam to irradiate a silicon film (); a probe beam source configured to emit a probe beam (L); a photodetector () configured to detect the probe beam (L) transmitted through the silicon film (); a processing apparatus () configured to calculate a standard deviation of detection values of a detection signal output from the photodetector, and to determine a crystalline state of the crystallized film based on the standard deviation.