The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 07, 2021

Filed:

Jul. 10, 2019
Applicant:

Fasmatech Science & Technology Ltd., Oxford, GB;

Inventors:

Dimitris Papanastasiou, Athens, GR;

Emmanuel Raptakis, Oxford, GB;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01J 49/42 (2006.01); G01N 27/622 (2021.01); H01J 49/00 (2006.01); H01J 49/06 (2006.01);
U.S. Cl.
CPC ...
H01J 49/4225 (2013.01); G01N 27/622 (2013.01); H01J 49/005 (2013.01); H01J 49/0054 (2013.01); H01J 49/062 (2013.01); H01J 49/426 (2013.01); H01J 49/4265 (2013.01);
Abstract

A linear ion trap system includes a linear ion trap having at least two discrete trapping regions for processing ions. An RF electrical potential generator produces two RF waveforms applied to a pair of pole electrodes of the linear ion trap forming a RF trapping field component to trap ions radially. A multi-output DC electrical potential generator produces a first set of multiple DC field components superimposed to the RF trapping field component and distributed across the length of the linear ion trap to control ions axially. A control unit is configured to switch the DC electrical potentials and DC field components collectively forming a first trapping region of the at least two discrete trapping regions that is populated with ions to alter ion potential energy from a first level to a second level, and to enable at least a first ion processing step in at least one of the first and second levels.


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