The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 07, 2021

Filed:

Mar. 26, 2018
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Gang Luo, Bellevue, WA (US);

Philip Shi-lung Yu, Chappaqua, NY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G06F 16/2453 (2019.01);
U.S. Cl.
CPC ...
G06F 16/24535 (2019.01); G06F 16/2453 (2019.01); G06F 16/24539 (2019.01);
Abstract

Methods and systems for maintaining a materialized view defined on a relation of a relational database include providing a materialized view maintenance system implemented in a computing device having at least a processor and a memory device. It is determined whether an update to a base relation is irrelevant with respect to the materialized view by performing content-based filtering on the base relation using the materialized view maintenance system. An estimate of at least one of an importance and an effect of the update to the base relation is generated. One or both of performing a load shedding operation on the relational database based upon the estimate and quantifying the effect of the update being omitted from the materialized view based on the estimate is performed. The maintained materialized view is displayed so as to exclude determined irrelevant updates.


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