The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 07, 2021
Filed:
Jun. 08, 2018
Universite D'aix-marseille, Marseilles, FR;
Centre National DE LA Recherche Scientifique, Paris, FR;
Universite DE Toulon, La Garde, FR;
David Grosso, Allauch, FR;
Thomas Bottein, TĂ©teghem, FR;
Other;
Abstract
Microtransfer molding process and patterned substrate obtainable therefrom The present invention pertains to the field of nanoimprint lithography (NIL) processes and more specifically to a MicroTransfer Molding process used for providing a sol-gel patterned layer on a substrate without any residual layer. The process comprises the following successive steps: (a) impregnating a soft mold with a sol-gel layer coated on a first substrate, under conditions of a relative solvent pressure adjusted such that the layer swells by vapor absorption between 10 and 60% vol., so as to fill the mold under the action of capillary forces, (b) removing the first substrate, (c) if needed, equilibrating the gel within the mold cavities, under a relative solvent pressure between 0 and 95%, in order to allow it to swell, (d) applying the swollen gel onto a second substrate to be patterned, (e) thermally treating this assembly so as to rigidify the gel, (f) removing the mold, and (g) curing the gel into a ceramic, thus forming a patterned substrate.