The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 07, 2021

Filed:

May. 31, 2018
Applicant:

Sulzer Management Ag, Winterthur, CH;

Inventors:

Robin Rettberg, Winterthur, CH;

Kaspar Löffel, Küsnacht, CH;

Jonas Ess, Basel, CH;

Marc Huber, Vogelsang AG, CH;

Martin Hartmann, Windisch, CH;

Assignee:

SULZER MANAGEMENT AG, Winterthur, CH;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
F01D 5/34 (2006.01); B22F 5/00 (2006.01); B22F 10/20 (2021.01); B33Y 10/00 (2015.01); B33Y 40/00 (2020.01); B33Y 80/00 (2015.01); B23K 101/00 (2006.01); B23K 26/342 (2014.01); F01D 5/04 (2006.01);
U.S. Cl.
CPC ...
F01D 5/34 (2013.01); B22F 5/009 (2013.01); B22F 10/20 (2021.01); B23K 26/342 (2015.10); B33Y 10/00 (2014.12); B33Y 40/00 (2014.12); F01D 5/043 (2013.01); B23K 2101/001 (2018.08); B33Y 80/00 (2014.12); F05D 2230/50 (2013.01); F05D 2240/30 (2013.01);
Abstract

A method for manufacturing an impeller of a rotary machine, the impeller including at least one vane limiting an inner channel, which is at least partly closed, the method includes successively manufactured the impeller of several material layers by a build-up process from a powder. The powder is applied in each case to a processing plane for the production of each material layer, and then a solid material layer is produced from the powder by a selective energy input, and structural orientation is determined for the impeller, according to which the impeller is built up in layers, and the structural orientation is defined by a first and a second angle, which angles describe the relative position of the impeller to the processing plane.


Find Patent Forward Citations

Loading…