The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 07, 2021

Filed:

May. 07, 2018
Applicant:

Eugene Technology Co., Ltd., Yongin-Si, KR;

Inventors:

Sung Ho Kang, Hwaseong-Si, KR;

Chang Dol Kim, Yongin-Si, KR;

Sang Don Lee, Yongin-Si, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2006.01); C23C 16/44 (2006.01); C23C 16/458 (2006.01); C23C 16/46 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45546 (2013.01); C23C 16/4412 (2013.01); C23C 16/4584 (2013.01); C23C 16/45504 (2013.01); C23C 16/45578 (2013.01); C23C 16/46 (2013.01);
Abstract

The present disclosure relates to an apparatus for processing a substrate, and more particularly, to an apparatus for processing a substrate, which is capable of allowing a substrate processing gas to smoothly flow on the substrate. The apparatus for processing the substrate in accordance an exemplary embodiment may form a laminar flow through a gas supply unit disposed on one side of an inner reaction tube and an exhaust duct disposed on the other side of the inner reaction tube, which faces the gas supply unit, to extend up to the outside of an accommodation region of a pedestal in an accommodation space of the inner reaction tube and control a flow of a substrate processing gas supplied onto the substrate.


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